Margaret Anderson
PMA

An incorrectly treated layer of photoresist led to ripples and tracks in an almost circuit-like pattern between holes created through the process of nanosphere photolithography. This technique involves exposing a layer of tiny translucent spheres to a laser at ultraviolet wavelengths. Via exposure to the laser radiation, a thin layer of photoresist experiences a change in chemical structure which causes it to wash away when developed with a specific chemical developer, essentially leaving behind a three-dimensional 'photograph' of the light exposure. The image is approximately 18 microns wide and 15 microns high.

maanders@caltech.edu