go to Caltech Home
image
image
 
home current exhibition submission archive about us contact
     
    A Beautiful Failure  
    Ripples in photoresist between an array of microscale holes produced through nanosphere photolithography.
Ripples in photoresist between an array of microscale holes produced through nanosphere photolithography.

 

next image

Margaret Anderson
PMA

An incorrectly treated layer of photoresist led to ripples and tracks in an almost circuit-like pattern between holes created through the process of nanosphere photolithography. This technique involves exposing a layer of tiny translucent spheres to a laser at ultraviolet wavelengths. Via exposure to the laser radiation, a thin layer of photoresist experiences a change in chemical structure which causes it to wash away when developed with a specific chemical developer, essentially leaving behind a three-dimensional 'photograph' of the light exposure. The image is approximately 18 microns wide and 15 microns high.

maanders@caltech.edu

go to top

   

 

 
   


© 2022 California Institute of Technology. All Rights Reserved.