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Michael Burek
Materials Science
A dual beam FEI Nova™ 600 Nanolab was used to generate focused ion beam images of 250 nm diameter copper nanopillars. The nanopillars were fabricated by electroplating from an acid copper plating solution into a prescribed polymethylmethacrylate (PMMA) template. The PMMA template was patterned using a Leica EBPG5000+ electron beam lithography system operating at 100kV. A 30kV Ga+ ion was used in order to image the electroplated copper nanopillars and investigate their microstructure. The image contrast is generated by varying Ga+ ion beam penetration depths due to differing grain-to-beam alignments. The grain microstructure here was an unexpected result of electroplating at a low current density. All tools used to fabricate and characterized this sample were made available in the Kavli Nanoscience Institute at CalTech.

   

 

 
    The 2009 Art of Science Competition was made possible by Student Affairs, the Art Committee, and Robert and Esther Metzner.

 

 

 

 

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